WebPHYSICAL and CHEMICAL PROPERTIES AZ 1505 1518 1529 1514H 1512HS 1518HS Solids content [%] 17.7 29.9 34.0 27.8 26.5 30.4 Viscosity [cSt at 25°C] 6.3 34.2 80.0 24.2 18.0 33.0 Absorptivity [l/g*cm] at 398nm 0.80 1.30 1.36 1.22 1.32 1.50 Solvent methoxy-propyl acetate (PGMEA) Max. water content [%] 0.50 Spectral sensitivity 310 - 440 nm … WebAZ1500 series –Recommended Process Parameters Process AZ1505 AZ1512 AZ1518 Dehydration Bake temp (°C) 150 150 150 (hot plate) time (min) 3 3 3 HMDS time (min) 3 3 3 (vapor) Spin coating speed (rpm) 3000 3000 3000 acceleration (rpm/s) 3000 3000 3000 time (s) 30 30 30 Soft-bake temp (°C) 80 100 120 (hot plate)
AZ 1500 (20cP) - TW - V1.0 PDF - Scribd
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一般光刻工艺过程 - 知乎 - 知乎专栏
WebFeb 3, 2024 · SU-8等一些光刻胶和光刻工艺的基本参数. 大高宽比,垂直性好,耐高温,光学透明,适用于MEMS工艺,钝化层,微流控以及光电子器件。. 大高宽比,垂直性好,耐高温,光学透明,较2000系列具有更好的基底粘附性,更不易在工艺过程中产生内应力积 … http://www.lxyee.net/Product/detail/id/668.html WebJun 5, 2024 · ruixibio. 光刻胶又称光致抗蚀剂,是指通过紫外光、电子束、离子束、X射线等的照射或辐射,其溶解度发生变化的耐蚀剂刻薄膜材料。. 可用于深硅刻蚀,适合于高深 … how does a thermocouple work simple